Invention Grant
- Patent Title: Semiconductor devices with heterojunction barrier regions and methods of fabricating same
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Application No.: US12719412Application Date: 2010-03-08
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Publication No.: US09029975B2Publication Date: 2015-05-12
- Inventor: Qingchun Zhang
- Applicant: Qingchun Zhang
- Applicant Address: US NC Durham
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US NC Durham
- Agency: Withrow & Terranova, P.L.L.C.
- Main IPC: H01L29/47
- IPC: H01L29/47 ; H01L29/16 ; H01L29/165 ; H01L29/66 ; H01L29/861 ; H01L29/872 ; H01L29/06

Abstract:
An electronic device includes a silicon carbide layer including an n-type drift region therein, a contact forming a junction, such as a Schottky junction, with the drift region, and a p-type junction barrier region on the silicon carbide layer. The p-type junction barrier region includes a p-type polysilicon region forming a P-N heterojunction with the drift region, and the p-type junction barrier region is electrically connected to the contact. Related methods are also disclosed.
Public/Granted literature
- US09117739B2 Semiconductor devices with heterojunction barrier regions and methods of fabricating same Public/Granted day:2015-08-25
Information query
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