Invention Grant
- Patent Title: Encapsulated semiconductor device and method for manufacturing the same
- Patent Title (中): 封装半导体器件及其制造方法
-
Application No.: US13697886Application Date: 2012-03-26
-
Publication No.: US09030003B2Publication Date: 2015-05-12
- Inventor: Masanori Minamio , Tatsuo Sasaoka
- Applicant: Masanori Minamio , Tatsuo Sasaoka
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2011-083300 20110405
- International Application: PCT/JP2012/002089 WO 20120326
- International Announcement: WO2012/137439 WO 20121011
- Main IPC: H01L23/495
- IPC: H01L23/495 ; H01L23/10 ; H01L23/433 ; H01L21/56 ; H01L23/00

Abstract:
An encapsulated semiconductor device includes: a first conduction path formative plate (1); a second conduction path formative plate (5) joined to the first conduction path formative plate; a power element (12) bonded to the first conduction path formative plate; a heatsink (14) held by the first conduction path formative plate with an insulation sheet (13) interposed between the heatsink and the first conduction path formative plate; and an encapsulation resin (9) configured to encapsulate the first and second conduction path formative plates. A through hole (3) or a lead gap (1b) is formed in a region of the first conduction path formative plate in contact with the insulation sheet. The insulation sheet is press-fitted into the through hole or the lead gap.
Public/Granted literature
- US20130056885A1 ENCAPSULATED SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2013-03-07
Information query
IPC分类: