Invention Grant
- Patent Title: Illumination optical system, exposure apparatus, and exposure method
- Patent Title (中): 照明光学系统,曝光装置和曝光方法
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Application No.: US12502474Application Date: 2009-07-14
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Publication No.: US09030645B2Publication Date: 2015-05-12
- Inventor: Masayuki Shiraishi
- Applicant: Masayuki Shiraishi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
- Priority: JP2008-182444 20080714
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20

Abstract:
In an illumination optical system, a light flux from a light source is made to come into a first fly's eye optical system, and an illumination area is illuminated, via a second fly's eye optical system and a condenser optical system, with light fluxes from a plurality of mirror elements which construct the first fly's eye optical system, wherein a reflecting surface of each of the mirror elements has a width in one direction narrower than a width of each of the mirror elements in a direction perpendicular to the one direction, and a reflectance distribution in the one direction of each of the mirror elements is trapezoidal. The intensity distribution of the illumination area can be set to be a nonuniform distribution, and respective points in the illumination area can be illuminated with the light fluxes having an approximately same aperture angle distribution.
Public/Granted literature
- US20100033699A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD Public/Granted day:2010-02-11
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