Invention Grant
US09031810B2 Methods and systems of object based metrology for advanced wafer surface nanotopography
有权
用于先进晶圆表面纳米成像的基于物体的计量方法和系统
- Patent Title: Methods and systems of object based metrology for advanced wafer surface nanotopography
- Patent Title (中): 用于先进晶圆表面纳米成像的基于物体的计量方法和系统
-
Application No.: US13170094Application Date: 2011-06-27
-
Publication No.: US09031810B2Publication Date: 2015-05-12
- Inventor: Haiguang Chen , Jaydeep K. Sinha , Sergey Kamensky
- Applicant: Haiguang Chen , Jaydeep K. Sinha , Sergey Kamensky
- Agent Deborah Wenocur
- Main IPC: G06F15/00
- IPC: G06F15/00 ; H01L21/66
Abstract:
A system and method for enhanced and expanded localized geometry characterization. Objects of interest are enhanced, detected, and classified according to user-defined parameters, and this enables enhanced contrast and more accurate feature detection, as well as more accurately defined feature object regions for feature geometry measurement and characterization.
Public/Granted literature
- US20120179419A1 METHODS AND SYSTEMS OF OBJECT BASED METROLOGY FOR ADVANCED WAFER SURFACE NANOTOPOGRAPHY Public/Granted day:2012-07-12
Information query
