Invention Grant
- Patent Title: Method of polishing object to be polished
- Patent Title (中): 抛光对象物的抛光方法
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Application No.: US13225961Application Date: 2011-09-06
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Publication No.: US09033764B2Publication Date: 2015-05-19
- Inventor: Kazumasa Kitamura , Tomoki Nagae
- Applicant: Kazumasa Kitamura , Tomoki Nagae
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Burr & Brown, PLLC
- Priority: JP2010-201729 20100909; JP2011-191422 20110902
- Main IPC: B24B1/00
- IPC: B24B1/00 ; B24B37/04 ; B24B7/22 ; B24B37/26 ; B24B37/005 ; B24B13/00 ; B24B37/00 ; B24B57/02

Abstract:
The present invention provides: a method of polishing an object to be polished for processing a surface of the object to be polished into a concave or convex state with a high degree of accuracy; and a polishing pad. An object to be polished is placed on a polishing pad over the boundary between the first polishing region and the second polishing region, the first polishing region has grooves and the second polishing region has grooves different from those of the first polishing region, and either one of the two regions being formed on a region on the center side, and the other on the outer side in a radial direction on the surface of the polishing pad; and the object to be polished is polished by rotating the polishing pad and the object to be polished.
Public/Granted literature
- US20120064803A1 METHOD OF POLISHING OBJECT TO BE POLISHED AND POLISHING PAD Public/Granted day:2012-03-15
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