Invention Grant
- Patent Title: Cleaning compositions for use in closed loop cleaning machines
- Patent Title (中): 用于闭环清洗机的清洁组合物
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Application No.: US12736446Application Date: 2009-02-27
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Publication No.: US09034108B2Publication Date: 2015-05-19
- Inventor: Konrad Geissler , Marius Kuemin
- Applicant: Konrad Geissler , Marius Kuemin
- Applicant Address: US MI Midland
- Assignee: Dow Global Technologies LLC
- Current Assignee: Dow Global Technologies LLC
- Current Assignee Address: US MI Midland
- Agency: Brooks, Cameron & Huebsch, PLLC
- International Application: PCT/US2009/001263 WO 20090227
- International Announcement: WO2009/126195 WO 20091015
- Main IPC: B08B3/08
- IPC: B08B3/08 ; B08B3/14 ; C11D7/26 ; C11D7/50 ; D06F43/00 ; D06L1/02 ; D06L1/10

Abstract:
Embodiments of the present disclosure include cleaning processes, closed loop cleaning machines, and methods of cleaning an article. The cleaning process includes contacting a surface of an article with a cleaning composition in a cleaning chamber, where the cleaning composition includes at least about 85 percent by weight organic solvents, based on total weight of the cleaning composition, and where at least about 5 percent by weight of the organic solvents is propylene glycol, based on total weight of the organic solvents, to clean the surface of the article, collecting the cleaning composition including contaminants, and recovering the cleaning composition via distillation, where a distillation apparatus removes the contaminants from the cleaning composition and is connected to the cleaning chamber by a process stream.
Public/Granted literature
- US20110088722A1 CLEANING COMPOSITIONS FOR USE IN CLOSED LOOP CLEANING MACHINES Public/Granted day:2011-04-21
Information query
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