Invention Grant
US09034124B2 Method for producing metal laminated substrate for oxide superconducting wire, and oxide superconducting wire using the substrate
有权
用于生产用于氧化物超导线的金属层压衬底的方法和使用该衬底的氧化物超导线
- Patent Title: Method for producing metal laminated substrate for oxide superconducting wire, and oxide superconducting wire using the substrate
- Patent Title (中): 用于生产用于氧化物超导线的金属层压衬底的方法和使用该衬底的氧化物超导线
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Application No.: US13127928Application Date: 2009-11-11
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Publication No.: US09034124B2Publication Date: 2015-05-19
- Inventor: Hironao Okayama , Akira Kaneko , Takeshi Kato , Masaya Konishi
- Applicant: Hironao Okayama , Akira Kaneko , Takeshi Kato , Masaya Konishi
- Applicant Address: JP Tokyo JP Osaka
- Assignee: TOYO KOHAN CO., LTD.,SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: TOYO KOHAN CO., LTD.,SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Tokyo JP Osaka
- Agency: Browdy and Neimark, PLLC
- Priority: JP2008-290308 20081112
- International Application: PCT/JP2009/006018 WO 20091111
- International Announcement: WO2010/055651 WO 20100520
- Main IPC: H01B12/02
- IPC: H01B12/02 ; H01L39/24

Abstract:
A metal laminated substrate for an oxide superconducting wire is manufactured such that a non-magnetic metal plate T1 having a thickness of not more than 0.2 mm and a metal foil T2 made of Cu alloy which is formed by cold rolling at a draft of not less than 90% and has a thickness of not more than 50 μm is laminated to each other by room-temperature surface active bonding, after lamination, crystal of the metal foil is oriented by heat treatment at a temperature of not less than 150° C. and not more than 1000° C. and, thereafter, an epitaxial growth film T3 made of Ni or an Ni alloy having a thickness of not more than 10 μm is laminated to the metal foil.
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