Invention Grant
US09034438B2 Deposition method using an aerosol gas deposition for depositing particles on a substrate
有权
使用气溶胶气体沉积法在基底上沉积颗粒的沉积方法
- Patent Title: Deposition method using an aerosol gas deposition for depositing particles on a substrate
- Patent Title (中): 使用气溶胶气体沉积法在基底上沉积颗粒的沉积方法
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Application No.: US13930328Application Date: 2013-06-28
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Publication No.: US09034438B2Publication Date: 2015-05-19
- Inventor: Eiji Fuchita , Yasutoshi Iriyama
- Applicant: Fuchita Nanotechnology Ltd. , National University Corporation Nagoya University
- Applicant Address: JP Chiba JP Aichi
- Assignee: Fuchita Nanotechnology LTD.,National University Corporation Nagoya University
- Current Assignee: Fuchita Nanotechnology LTD.,National University Corporation Nagoya University
- Current Assignee Address: JP Chiba JP Aichi
- Agency: Saliwanchik, Lloyd & Eisenschenk
- Priority: JP2012-145311 20120628
- Main IPC: B05D1/12
- IPC: B05D1/12 ; C23C24/02

Abstract:
A deposition method includes placing fine particles in an airtight container, the fine particles being obtained by forming a coating layer on a surface of a matrix, the coating layer being more liable to be charged than the matrix with respect to a material of a conveying path, generating an aerosol of the fine particles by introducing a career gas into the airtight container, transporting the aerosol via a transfer tubing to a deposition chamber which is maintained at a pressure lower than that in the airtight container while charging the fine particles by friction with the inner surface of the transfer tubing, the transfer tubing being connected to the airtight container and having a nozzle at the tip, and depositing the charged fine particles on a substrate placed in the deposition chamber by spraying the aerosol from the nozzle.
Public/Granted literature
- US20140004260A1 DEPOSITION METHOD Public/Granted day:2014-01-02
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