Invention Grant
US09034761B2 Heteroleptic (allyl)(pyrroles-2-aldiminate) metal-containing precursors, their synthesis and vapor deposition thereof to deposit metal-containing films
有权
含异丁烯（烯丙基）（吡咯-2-醛亚胺）金属的前体，它们的合成和气相沉积以沉积含金属的膜
- Patent Title: Heteroleptic (allyl)(pyrroles-2-aldiminate) metal-containing precursors, their synthesis and vapor deposition thereof to deposit metal-containing films
- Patent Title (中): 含异丁烯（烯丙基）（吡咯-2-醛亚胺）金属的前体，它们的合成和气相沉积以沉积含金属的膜
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Application No.: US14159815Application Date: 2012-06-29
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Publication No.: US09034761B2Publication Date: 2015-05-19
- Inventor: Clément Lansalot-Matras , Andrey V. Korolev
- Applicant: Clément Lansalot-Matras , Andrey V. Korolev
- Applicant Address: FR Paris US TX Houston
- Assignee: L'Air Liquide, SociétéAnonyme pour l'Etude et l'Exploitation des Procédés Georges Claude,American Air Liquide, Inc.
- Current Assignee: L'Air Liquide, SociétéAnonyme pour l'Etude et l'Exploitation des Procédés Georges Claude,American Air Liquide, Inc.
- Current Assignee Address: FR Paris US TX Houston
- Agent Patricia E. McQueeney
- International Application: PCT/US2012/044950 WO 20120629
- International Announcement: WO2013/015947 WO 20130131
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L21/285 ; C07F15/04 ; H01L21/768
Abstract:
Disclosed are metal-containing precursors having the formula Compound (I) wherein: —M is a metal selected from Ni, Co, Mn, Pd; and —each of R-1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 are independently selected from H; a C1-C4 linear, branched, or cyclic alkyl group; a C1-C4 linear, branched, or cyclic alkylsilyl group (mono, bis, or tris alkyl); a C1-C4 linear, branched, or cyclic alkylamino group; or a C1-C4 linear, branched, or cyclic fluoroalkyl group. Also disclosed are methods of synthesizing and using the disclosed metal-containing precursors to deposit metal-containing films on a substrate via a vapor deposition process.
Public/Granted literature
Information query
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