Invention Grant
- Patent Title: Laser irradiation apparatus
- Patent Title (中): 激光照射装置
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Application No.: US13067611Application Date: 2011-06-14
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Publication No.: US09035215B2Publication Date: 2015-05-19
- Inventor: Won-Kyu Lee , Jae-Beom Choi , Jae-Hwan Oh , Young-Jin Chang , Seong-Hyun Jin
- Applicant: Won-Kyu Lee , Jae-Beom Choi , Jae-Hwan Oh , Young-Jin Chang , Seong-Hyun Jin
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2010-0069154 20100716
- Main IPC: B23K26/00
- IPC: B23K26/00 ; H01L21/268 ; B23K26/06

Abstract:
A laser irradiation apparatus for irradiating a laser beam to a semiconductor layer including a plurality of pixel areas, the apparatus includes a laser generator generating the laser beam, and an optical switching unit time-dividing the laser beam generated from the laser generator and transmitting a plurality of time-divided laser beams to a plurality of optical systems. The apparatus includes a first optical system of the plurality of optical systems that receives a first time-divided laser beam and irradiates a first laser slit beam along a first irradiation direction, and a second optical system of the plurality of optical systems that receives a second time-divided laser beam and irradiates a second laser slit beam along a second irradiation direction that is parallel with the first irradiation direction. The first laser slit beam and the second laser slit beam crystallize partial areas at a same location in the respective pixel areas.
Public/Granted literature
- US20120012568A1 Laser irradiation apparatus Public/Granted day:2012-01-19
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