Invention Grant
- Patent Title: Formation of pattern replicating tools
- Patent Title (中): 形成模式复制工具
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Application No.: US11711928Application Date: 2007-02-27
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Publication No.: US09039401B2Publication Date: 2015-05-26
- Inventor: W. Dennis Slafer
- Applicant: W. Dennis Slafer
- Applicant Address: US MA Cambridge
- Assignee: MicroContinuum, Inc.
- Current Assignee: MicroContinuum, Inc.
- Current Assignee Address: US MA Cambridge
- Agency: McDermott Will & Emery LLP
- Main IPC: B29C43/00
- IPC: B29C43/00 ; B29C33/38 ; B29C33/30 ; B29C33/42

Abstract:
Systems, methods, and apparatus are disclosed for making patterning tools from one or more discrete elements. Such tools can have one or more “seams” or joints where the individual elements abut which can limit the tools' performance and utility in roll-to-roll manufacturing. Methods are described herein for producing “near-seamless” tools, that is, tools having seams that exhibit minimum disruption of the tool pattern and thus improved material produced by such tools. The patterning tools can be cylindrical and/or closed in shape.
Public/Granted literature
- US20080106001A1 Formation of pattern replicating tools Public/Granted day:2008-05-08
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