Invention Grant
US09039863B2 Substrate processing apparatus, substrate processing method, and computer readable storage medium storing substrate processing program
有权
基板处理装置，基板处理方法以及存储基板处理程序的计算机可读存储介质
- Patent Title: Substrate processing apparatus, substrate processing method, and computer readable storage medium storing substrate processing program
- Patent Title (中): 基板处理装置，基板处理方法以及存储基板处理程序的计算机可读存储介质
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Application No.: US13677534Application Date: 2012-11-15
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Publication No.: US09039863B2Publication Date: 2015-05-26
- Inventor: Shuhei Matsumoto , Shuji Iwanaga , Hiroshi Tomita , Kenji Nakamizo , Satoshi Morita
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2011-254087 20111121
- Main IPC: C23F1/00
- IPC: C23F1/00 ; H01L21/67 ; G05D3/00
Abstract:
Disclosed is a liquid processing apparatus capable of accurately determining a holding state of a substrate without being influenced by, for example, material or surface condition of a substrate. The liquid processing apparatus includes a substrate holding unit that holds a substrate, a camera that photographs a region where a peripheral edge portion of substrate is present when substrate is properly held by the substrate holding unit, and a control unit that determines a holding state of the substrate held by the substrate holding unit based on an image photographed by the camera.
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