Invention Grant
- Patent Title: Polishing composition for nickel-phosphorous-coated memory disks
- Patent Title (中): 镍 - 磷涂层记录盘抛光组合物
-
Application No.: US13478292Application Date: 2012-05-23
-
Publication No.: US09039914B2Publication Date: 2015-05-26
- Inventor: Selvaraj Palanisamy Chinnathambi , Haresh Siriwardane
- Applicant: Selvaraj Palanisamy Chinnathambi , Haresh Siriwardane
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas E Omholt; Francis J Koszyk
- Main IPC: B44C1/22
- IPC: B44C1/22 ; C09K3/14 ; H01L21/321 ; H01L21/306
Abstract:
The invention provides a chemical-mechanical polishing composition containing wet-process silica, an oxidizing agent that oxidizes nickel-phosphorous, a chelating agent, polyvinyl alcohol, and water. The invention also provides a method of chemically-mechanically polishing a substrate, especially a nickel-phosphorous substrate, by contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.
Public/Granted literature
- US20130313226A1 POLISHING COMPOSITION FOR NICKEL-PHOSPHOROUS-COATED MEMORY DISKS Public/Granted day:2013-11-28
Information query
