Invention Grant
- Patent Title: Method for manufacturing semiconductor light emitting element
- Patent Title (中): 半导体发光元件的制造方法
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Application No.: US13601231Application Date: 2012-08-31
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Publication No.: US09040322B2Publication Date: 2015-05-26
- Inventor: Taisuke Sato , Kotaro Zaima , Jumpei Tajima , Naoharu Sugiyama , Shinya Nunoue
- Applicant: Taisuke Sato , Kotaro Zaima , Jumpei Tajima , Naoharu Sugiyama , Shinya Nunoue
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-270709 20111209
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L33/12 ; H01L33/24 ; H01L33/00 ; H01L33/22

Abstract:
According to one embodiment, a method is disclosed for manufacturing a semiconductor light emitting element. The method can include bonding a stacked main body of a structural body to a substrate main body. The structural body includes a growth substrate and the stacked main body provided on the growth substrate. The stacked main body includes a first nitride semiconductor film, a light emitting film provided on the first nitride semiconductor film, and a second nitride semiconductor film provided on the light emitting film. The method can include removing the growth substrate. The method can include forming a plurality of stacked bodies. The method can include forming an uneven portion in a surface of a first nitride semiconductor layer. The method can include forming a plurality of the semiconductor light emitting elements.
Public/Granted literature
- US20130244360A1 METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING ELEMENT Public/Granted day:2013-09-19
Information query
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