Invention Grant
- Patent Title: Exposure apparatus and exposure method
- Patent Title (中): 曝光装置和曝光方法
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Application No.: US13379653Application Date: 2011-12-08
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Publication No.: US09041909B2Publication Date: 2015-05-26
- Inventor: Minghung Shih , Jehao Hsu , Jingfeng Xue
- Applicant: Minghung Shih , Jehao Hsu , Jingfeng Xue
- Applicant Address: CN Guangdong
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Guangdong
- Priority: CN201110398588 20111205
- International Application: PCT/CN2011/083689 WO 20111208
- International Announcement: WO2013/082782 WO 20130613
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer, wherein the light rays pass through the mask and the transparent substrate to reach the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the transparent substrate and the photo-resist layer back to the photo-resist layer. The present invention can reduce a line space of a pattern of the photo-resist layer.
Public/Granted literature
- US20130141705A1 EXPOSURE APPARATUS AND EXPOSURE METHOD Public/Granted day:2013-06-06
Information query
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