Invention Grant
- Patent Title: Spectral purity filters for use in a lithographic apparatus
- Patent Title (中): 用于光刻设备的光谱纯度滤光片
-
Application No.: US13617705Application Date: 2012-09-14
-
Publication No.: US09041912B2Publication Date: 2015-05-26
- Inventor: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrey Mikhailovich Yakunin , Martin Jacobus Johan Jak
- Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrey Mikhailovich Yakunin , Martin Jacobus Johan Jak
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03F7/20 ; G21K1/10
Abstract:
According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.
Public/Granted literature
- US20130010363A1 Spectral Purity Filters for Use in a Lithographic Apparatus Public/Granted day:2013-01-10
Information query
