Invention Grant
US09042162B2 SRAM cells suitable for Fin field-effect transistor (FinFET) process
有权
适用于Fin场效应晶体管(FinFET)工艺的SRAM单元
- Patent Title: SRAM cells suitable for Fin field-effect transistor (FinFET) process
- Patent Title (中): 适用于Fin场效应晶体管(FinFET)工艺的SRAM单元
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Application No.: US14066817Application Date: 2013-10-30
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Publication No.: US09042162B2Publication Date: 2015-05-26
- Inventor: Peter Lee , Winston Lee
- Applicant: Marvell World Trade Ltd.
- Applicant Address: BB St. Michael
- Assignee: Marvell World Trade Ltd.
- Current Assignee: Marvell World Trade Ltd.
- Current Assignee Address: BB St. Michael
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C11/419 ; G11C11/412

Abstract:
A static random access memory (SRAM) cell includes first and second n-channel transistors, first and second p-channel transistors, first and second enable transistors, and first and second pass gates. The first n-channel transistor, the first p-channel transistor, and the first enable transistor are connected in series between first and second reference potentials. The second n-channel transistor, the second p-channel transistor, and the second enable transistor are connected in series between the first and second reference potentials. The first pass gate is configured to selectively connect a first bitline to a first node. The first node is connected to a gate of the first n-channel transistor and a gate of the first p-channel transistor. The second pass gate is configured to selectively connect a second bitline to a second node. The second node is connected to a gate of the second n-channel transistor and a gate of the second p-channel transistor.
Public/Granted literature
- US20140119103A1 SRAM Cells Suitable for Fin Field-Effect Transistor (FinFET) Process Public/Granted day:2014-05-01
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