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US09042417B2 Photonic device structure and fabrication method thereof 有权
光子器件结构及其制造方法

Photonic device structure and fabrication method thereof
Abstract:
Various embodiments of a photonic device and fabrication method thereof are provided. In one aspect, a device includes a substrate, a current confinement layer disposed on the substrate, an absorption layer disposed in the current confinement layer, and an electrical contact layer disposed on the absorption layer. The current confinement layer is doped in a pattern and configured to reduce dark current in the device. The photonic device may be a photodiode or a laser.
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