Invention Grant
- Patent Title: Manufacturing method and system of target
- Patent Title (中): 目标的制造方法和制度
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Application No.: US13428568Application Date: 2012-03-23
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Publication No.: US09043193B2Publication Date: 2015-05-26
- Inventor: Jikai Zhang , Jiyu Wan , Hongjiang Wu , Seungmoo Rim
- Applicant: Jikai Zhang , Jiyu Wan , Hongjiang Wu , Seungmoo Rim
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: Ladas & Parry LLP
- Priority: CN201110072318 20110324
- Main IPC: G01B21/18
- IPC: G01B21/18 ; C23C14/34 ; H01J37/34

Abstract:
The disclosed technology provides a manufacturing method of a target comprising obtaining an initial mass and a residual mass of the target sample, and calculating an etching mass; determining a relative etching depth of the target sample; calculating a relative etching mass based on the etching mass and the relative etching depth; determining a utilization parameter of the target sample based on the relative etching mass and the initial mass of the target sample before being used; and performing a simulation and optimization process on the utilization parameter of the target sample, obtaining target parameters corresponding to a preset value of the utilization parameter, and outputting the target parameters to a manufacturing control center for manufacturing a target. The disclosed technology also provides a manufacturing system of a target.
Public/Granted literature
- US20120245725A1 MANUFACTURING METHOD AND SYSTEM OF TARGET Public/Granted day:2012-09-27
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