Invention Grant
US09043525B2 Optimizing a rate of transfer of data between an RF generator and a host system within a plasma tool
有权
优化等离子体工具内的RF发生器和主机系统之间的数据传输速率
- Patent Title: Optimizing a rate of transfer of data between an RF generator and a host system within a plasma tool
- Patent Title (中): 优化等离子体工具内的RF发生器和主机系统之间的数据传输速率
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Application No.: US13715942Application Date: 2012-12-14
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Publication No.: US09043525B2Publication Date: 2015-05-26
- Inventor: John C. Valcore, Jr.
- Applicant: John C. Valcore, Jr.
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: G06F13/40
- IPC: G06F13/40 ; H01J37/32 ; H05H1/46 ; G06F13/42

Abstract:
A bus interconnect interfaces a host system to a radio frequency (RF) generator that is coupled to a plasma chamber. The bus interconnect includes a first set of host ports, which are used to provide a power component setting and a frequency component setting to the RF generator. The ports of the first set of host ports are used to receive distinct variables that change over time. The bus interconnect further includes a second set of generator ports used to send a power read back value and a frequency read back value to the host system. The bus interconnect includes a sampler circuit integrated with the host system. The sampler circuit is configured to sample signals at the ports of the first set at selected clock edges to capture operating state data of the plasma chamber and the RF generator.
Public/Granted literature
- US20140173158A1 Rate of Transfer of Data Within A Plasma System Public/Granted day:2014-06-19
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