Invention Grant
- Patent Title: Production method of wafer lens
- Patent Title (中): 晶圆透镜的制作方法
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Application No.: US13392817Application Date: 2010-08-23
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Publication No.: US09044879B2Publication Date: 2015-06-02
- Inventor: Yuiti Fujii , Shigeru Hosoe , Toshiya Takitani , Akihiro Fujimoto
- Applicant: Yuiti Fujii , Shigeru Hosoe , Toshiya Takitani , Akihiro Fujimoto
- Applicant Address: JP Tokyo
- Assignee: Konica Minolta Opto, Inc.
- Current Assignee: Konica Minolta Opto, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Cozen O'Connor
- Priority: JP2009-200168 20090831
- International Application: PCT/JP2010/064157 WO 20100823
- International Announcement: WO2011/024745 WO 20110303
- Main IPC: B29D11/00
- IPC: B29D11/00 ; B29C39/00 ; B29C39/10 ; B29C39/24 ; B29L11/00

Abstract:
The aim is to regulate thickness on the optical axis in the production of wafer lenses. Disclosed is a wafer lens production method that is equipped with a dispensing process for dropping resin onto a molding die (64), an imprinting process for pressing either the molding die (64) or a glass substrate (2) toward the other, and a releasing process for releasing the glass substrate (2) from the molding die (64), and that repeats the processing from the dispensing process to the releasing process as a single cycle and successively forms resin lenses (4) on the glass substrate 2); wherein the height (A) of the non-lens area (6) surrounding the lenses (4) and the heights (B and C) of the glass substrate (2) are measured between the releasing process of a first cycle and the dispensing process of a second cycle, and the position of the molding die (64) is corrected for imprinting processes of the second cycle, on the basis of the heights (A-C).
Public/Granted literature
- US20120153516A1 Production Method of Wafer Lens Public/Granted day:2012-06-21
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