Invention Grant
US09046766B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same
有权
光化感光或辐射敏感树脂组合物和使用其的图案形成方法
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same
- Patent Title (中): 光化感光或辐射敏感树脂组合物和使用其的图案形成方法
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Application No.: US12499515Application Date: 2009-07-08
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Publication No.: US09046766B2Publication Date: 2015-06-02
- Inventor: Takayuki Kato , Michihiro Shirakawa , Hyou Takahashi
- Applicant: Takayuki Kato , Michihiro Shirakawa , Hyou Takahashi
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-179228 20080709; JP2009-146250 20090619
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; C07C303/32 ; C07C309/04 ; C07C309/06 ; C07C309/12 ; C07C309/13 ; C07C309/19 ; G03F7/039 ; G03F7/20 ; G03F7/11
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin that exhibits an increased solubility in an alkali developer when acted on by an acid, and (B) at least two types of sulfonic acid generators that generate a sulfonic acid when exposed to actinic rays or radiation, wherein the two types of sulfonic acid generators (B) consist of sulfonic acid generators (B1) and (B2) satisfying the following requirements, namely the sulfonic acid generator (B1) generates a sulfonic acid composed of 9 to 20 elements with an acid strength (pKa) satisfying the relationship pKa pKa≧−3.50, provided that no hydrogen atom is included in the number of elements of the generated acids.
Public/Granted literature
- US20100009288A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING SAME Public/Granted day:2010-01-14
Information query
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