Invention Grant
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound
- Patent Title (中): 光敏性或辐射敏感性树脂组合物，使用其的图案形成方法，聚合性化合物和聚合性化合物
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Application No.: US12409825Application Date: 2009-03-24
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Publication No.: US09046773B2Publication Date: 2015-06-02
- Inventor: Shuhei Yamaguchi , Yuko Yoshida , Akinori Shibuya , Michihiro Shirakawa
- Applicant: Shuhei Yamaguchi , Yuko Yoshida , Akinori Shibuya , Michihiro Shirakawa
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-082237 20080326; JP2008-082238 20080326; JP2008-334108 20081226; JP2008-334109 20081226; JP2009-058580 20090311; JP2009-058581 20090311
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/075 ; G03F7/20 ; G03F7/30 ; G03F7/004
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and a polymer compound obtained by polymerizing the polymerizable compound are provided.
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