Invention Grant
- Patent Title: Method for controlled growth of silicon carbide and structures produced by same
- Patent Title (中): 碳化硅的控制生长方法及其制造的结构
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Application No.: US13769977Application Date: 2013-02-19
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Publication No.: US09048166B2Publication Date: 2015-06-02
- Inventor: Robert Tyler Leonard , Hudson M. Hobgood , William A. Thore
- Applicant: Cree, Inc.
- Applicant Address: US NC Durham
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US NC Durham
- Agency: Moore & Van Allen PLLC
- Agent Steven B. Phillips
- Main IPC: H01L29/16
- IPC: H01L29/16 ; C30B23/00 ; C30B29/36 ; C30B23/02

Abstract:
A method for controlled growth of silicon carbide and structures produced by the method are disclosed. A crystal of silicon carbide (SiC) can be grown by placing a sacrificial substrate in a growth zone with a source material. The source material may include a low-solubility impurity. SiC is then grown on the sacrificial substrate to condition the source material. The sacrificial substrate is then replaced with the final substrate, and SiC is grown on the final substrate. A single crystal of silicon carbide is produced, wherein the crystal of silicon carbide has substantially few micropipe defects. Such a crystal may also include a substantially uniform concentration of the low-solubility impurity, and may be used to make wafers and/or SiC die.
Public/Granted literature
- US20130153928A1 METHOD FOR CONTROLLED GROWTH OF SILICON CARBIDE AND STRUCTURES PRODUCED BY SAME Public/Granted day:2013-06-20
Information query
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