Invention Grant
- Patent Title: Method of manufacturing semiconductor device
- Patent Title (中): 制造半导体器件的方法
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Application No.: US14108117Application Date: 2013-12-16
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Publication No.: US09048331B2Publication Date: 2015-06-02
- Inventor: Kiyoshi Oi , Yoshihiro Machida , Hiroyuki Saito , Yohei Igarashi
- Applicant: Shinko Electric Industries Co., Ltd.
- Applicant Address: JP Nagano-ken
- Assignee: Shinko Electric Industries Co., LTD.
- Current Assignee: Shinko Electric Industries Co., LTD.
- Current Assignee Address: JP Nagano-ken
- Agency: Wolf, Greenfield & Sacks, P.C.
- Priority: JP2012-275832 20121218
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/00 ; H01L23/498 ; H01L21/56

Abstract:
A method of manufacturing a semiconductor chip includes forming a masking member including an opening on a wiring substrate including a chip mounting region so as to align the opening with the chip mounting region, forming an uncured sealing resin on at least the chip mounting region of the wiring substrate, wherein a support film is formed on the uncured sealing resin, removing the support film from the uncured sealing resin, removing the masking member from the wiring substrate so that the uncured sealing resin remains on the chip mounting region, and flip-chip mounting a semiconductor chip onto the chip mounting region with the uncured sealing resin arranged in between. The uncured sealing resin has a higher temperature when removing the masking member than when removing the support film.
Public/Granted literature
- US20140170810A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2014-06-19
Information query
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