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US09048346B2 Semiconductor light emitting device including a metal nitride buffer layer and fabrication method thereof 有权
包括金属氮化物缓冲层的半导体发光器件及其制造方法

Semiconductor light emitting device including a metal nitride buffer layer and fabrication method thereof
Abstract:
Provided are embodiments of a light emitting device and fabrication methods thereof. The light emitting device can include a buffer layer provided between a substrate and a semiconductor layer incorporating a high fusion point metal. In a fabrication method of the light emitting device, the buffer layer incorporating a high fusion point metal can be formed on a substrate, and a semiconductor layer can be formed on the buffer layer.
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