Invention Grant
- Patent Title: Semiconductor light emitting device including a metal nitride buffer layer and fabrication method thereof
- Patent Title (中): 包括金属氮化物缓冲层的半导体发光器件及其制造方法
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Application No.: US11734872Application Date: 2007-04-13
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Publication No.: US09048346B2Publication Date: 2015-06-02
- Inventor: Kyong Jun Kim
- Applicant: Kyong Jun Kim
- Applicant Address: KR Seoul
- Assignee: LG INNOTEK CO., LTD.
- Current Assignee: LG INNOTEK CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: Saliwanchik, Lloyd & Eisenschenk
- Priority: KR10-2006-0033828 20060414
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/12 ; H01L21/02

Abstract:
Provided are embodiments of a light emitting device and fabrication methods thereof. The light emitting device can include a buffer layer provided between a substrate and a semiconductor layer incorporating a high fusion point metal. In a fabrication method of the light emitting device, the buffer layer incorporating a high fusion point metal can be formed on a substrate, and a semiconductor layer can be formed on the buffer layer.
Public/Granted literature
- US20070241350A1 Light Emitting Device and Fabrication Method Thereof Public/Granted day:2007-10-18
Information query
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