Invention Grant
- Patent Title: Non-halogenated etchant and method of manufacturing a display substrate using the non-halogenated etchant
- Patent Title (中): 非卤化蚀刻剂和使用非卤化蚀刻剂制造显示衬底的方法
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Application No.: US13330657Application Date: 2011-12-19
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Publication No.: US09048430B2Publication Date: 2015-06-02
- Inventor: Seon-Il Kim , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun Jin
- Applicant: Seon-Il Kim , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun Jin
- Applicant Address: KR Yongin KR Seoul
- Assignee: Samsung Display Co., Ltd.,Dongwoo Fine-Chem Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.,Dongwoo Fine-Chem Co., Ltd.
- Current Assignee Address: KR Yongin KR Seoul
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2011-0013098 20110215
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L51/00
Abstract:
Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.
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