Invention Grant
- Patent Title: Rolled copper or copper-alloy foil provided with roughened surface
- Patent Title (中): 轧制铜或铜合金箔带有粗糙表面
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Application No.: US14004794Application Date: 2012-02-10
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Publication No.: US09049795B2Publication Date: 2015-06-02
- Inventor: Hideta Arai , Atsushi Miki
- Applicant: Hideta Arai , Atsushi Miki
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Howson & Howson LLP
- Priority: JP2011-067748 20110325
- International Application: PCT/JP2012/053106 WO 20120210
- International Announcement: WO2012/132576 WO 20121004
- Main IPC: B32B15/20
- IPC: B32B15/20 ; H05K1/09 ; C25D5/10 ; C25D7/06 ; H05K3/38 ; C25D3/38

Abstract:
Provided is a rolled copper or copper-alloy foil having a roughened surface, the rolled copper or copper-alloy foil subjected to roughening treatment with copper fine grains wherein a copper base plating layer is provided between the copper roughened layer and the rolled copper or copper-alloy foil. An object of the present invention is to provide a roughened rolled copper-alloy foil having fewer craters, the presence of which is a serious disadvantage unique to a rolled copper-alloy foil having a roughened surface. In particular, provided is a rolled copper or copper-alloy foil in which the development of craters caused by inclusions present in or near a surface of the base material can be controlled.
Public/Granted literature
- US20140037976A1 Rolled Copper or Copper-Alloy Foil Provided with Roughened Surface Public/Granted day:2014-02-06
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