Invention Grant
- Patent Title: Self-conditioning polishing pad and a method of making the same
- Patent Title (中): 自调式抛光垫及其制作方法
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Application No.: US13797121Application Date: 2013-03-12
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Publication No.: US09050697B2Publication Date: 2015-06-09
- Inventor: Scott B. Daskiewich
- Applicant: JH Rhodes Company, Inc.
- Applicant Address: US AZ Tempe
- Assignee: JH Rhodes Company, Inc.
- Current Assignee: JH Rhodes Company, Inc.
- Current Assignee Address: US AZ Tempe
- Agency: Snell & Wilmer L.L.P.
- Main IPC: B24D11/00
- IPC: B24D11/00 ; B32B5/22 ; B24B37/24 ; B24B37/26 ; C08J9/35
Abstract:
The present invention is directed to a self-conditioning polishing pad. The self-conditioning polishing pad comprises an insoluble polymeric foam matrix and insoluble polymeric foam particles within the foam matrix. The particles are coated with a water-soluble component over a portion of the surface area of the particle. The particles may have a diameter in the range of 5 to 1000 microns in diameter.
Public/Granted literature
- US20130252519A1 SELF-CONDITIONING POLISHING PAD AND A METHOD OF MAKING THE SAME Public/Granted day:2013-09-26
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