Invention Grant
- Patent Title: Imprint method
- Patent Title (中): 印记法
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Application No.: US14083592Application Date: 2013-11-19
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Publication No.: US09050752B2Publication Date: 2015-06-09
- Inventor: Yasuaki Ootera , Yoshiyuki Kamata , Naoko Kihara , Yoshiaki Kawamonzen
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Nixon & Vanderhye, P.C.
- Priority: JP2012-254508 20121120
- Main IPC: G03F7/00
- IPC: G03F7/00 ; B29C59/02 ; G03F7/027 ; G03F7/038

Abstract:
An imprint method according to this embodiment includes preparing a mold having a recessed portion, filling the recessed portion with a mold non-reactive material, pressing the mold against a resist which is applied on a base material, curing the resist in a state that the mold is pressed, and separating the mold from the base material. The mold non-reactive material is a material which does not chemically react with a material of the mold. By curing of the resist, the resist and the mold non-reactive material are coupled. When the mold is separated from the base material, the resist and the mold non-reactive material are left on the base material.
Public/Granted literature
- US20140138354A1 IMPRINT METHOD Public/Granted day:2014-05-22
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