Invention Grant
- Patent Title: Liquid ejecting apparatus and maintenance method of the same
- Patent Title (中): 液体喷射装置及其维护方法
-
Application No.: US14225780Application Date: 2014-03-26
-
Publication No.: US09050812B2Publication Date: 2015-06-09
- Inventor: Shinichi Tanaka
- Applicant: Seiko Epson Corporation
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: JP2013-071607 20130329
- Main IPC: B41J2/165
- IPC: B41J2/165 ; B41J2/17 ; B41J3/28 ; B41J25/308

Abstract:
A liquid ejecting apparatus includes a support stage that supports a recording medium; a liquid ejecting portion that has a liquid ejecting unit ejecting an ink to the supported recording medium; a ventilation fan that causes a gas to flow between the liquid ejecting unit and the support stage; a throttle portion that increases a flow velocity of the gas; and a controller that is enabled to execute a strong wind mode in which the gas increased in the flow velocity by the throttle portion flows between the liquid ejecting portion and the support stage, and a breeze mode in which the gas before being increased in the flow velocity by the throttle portion flows between the liquid ejecting portion and the support stage. The controller executes the breeze mode during recording work and executes the strong wind mode during non-recording work.
Public/Granted literature
- US20140292854A1 LIQUID EJECTING APPARATUS AND MAINTENANCE METHOD OF THE SAME Public/Granted day:2014-10-02
Information query
IPC分类: