Invention Grant
US09051173B2 Treatment method of a getter material and encapsulation method of such getter material 有权
吸气材料的处理方法和这种吸气材料的包封方法

Treatment method of a getter material and encapsulation method of such getter material
Abstract:
A treatment method for a getter material is provided, including forming a protective layer on the thin layer getter material by performing at least one oxidation and/or nitriding step of the thin layer getter material conducted under dry atmosphere of dioxygen and/or dinitrogen, wherein the protective layer is composed of oxide and/or nitride of the thin layer getter material, and wherein a thickness of the protective layer is between approximately 1 nm and 10 nm.
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