Invention Grant
US09051247B2 Salt, photoresist composition, and method for producing photoresist pattern
有权
盐,光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
- Patent Title: Salt, photoresist composition, and method for producing photoresist pattern
- Patent Title (中): 盐,光致抗蚀剂组合物和制造光致抗蚀剂图案的方法
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Application No.: US13443175Application Date: 2012-04-10
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Publication No.: US09051247B2Publication Date: 2015-06-09
- Inventor: Yukako Anryu , Koji Ichikawa
- Applicant: Yukako Anryu , Koji Ichikawa
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2011-088881 20110413
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/38 ; C07C303/32 ; C07C309/06 ; C07C309/12 ; C07C309/19 ; C07D327/08 ; C07C309/17 ; C07D333/46 ; C07C381/12 ; C07C25/18 ; C08F220/28 ; C08F220/38 ; G03F7/039 ; G03F7/20

Abstract:
A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, Ll represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that Ll is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, Rl represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z+ represents an organic cation.
Public/Granted literature
- US20120328986A1 SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN Public/Granted day:2012-12-27
Information query
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