Invention Grant
- Patent Title: Method for producing hollow silicone fine particles
- Patent Title (中): 中空硅氧烷微粒的制造方法
-
Application No.: US12281138Application Date: 2007-02-20
-
Publication No.: US09051490B2Publication Date: 2015-06-09
- Inventor: Akira Takaki , Takamitsu Amano , Ryutarou Mukai
- Applicant: Akira Takaki , Takamitsu Amano , Ryutarou Mukai
- Applicant Address: JP Osaka-shi
- Assignee: KANEKA CORPORATION
- Current Assignee: KANEKA CORPORATION
- Current Assignee Address: JP Osaka-shi
- Agency: Morrison & Foerster LLP
- Priority: JP2006-056999 20060302; JP2006-273776 20061005
- International Application: PCT/JP2007/053048 WO 20070220
- International Announcement: WO2007/099814 WO 20070907
- Main IPC: B29C59/00
- IPC: B29C59/00 ; C09D183/04 ; B01J13/18

Abstract:
Hollow silicone fine particles have high productivity, low breakability, a narrow particle size distribution and a volume average particle diameter equal to or lower than 1 μm. The hollow particles are made by removing organic macromolecular particles and/or an organic solvent away form inside core-shell particles produced by coating particles made from the organic macromolecular particles and/or the organic solvent with silicone compound that is made from one or more units selected from the group consisting of SiO4/2 unit, RSiO3/2 unit, and R2SiO2/2 unit (wherein R is C1-4 alkyl groups, C6-24 aromatic groups, a vinyl group, a γ-(meth)acryloxypropyl group or organic groups having an SH group(s)), the silicone compound containing R2SiO2/2 unit by 20 mole % or less.
Public/Granted literature
- US20090004418A1 Method for Producing Hollow Silicone Fine Particles Public/Granted day:2009-01-01
Information query