Invention Grant
- Patent Title: In-situ sputtering apparatus
- Patent Title (中): 原位溅射装置
-
Application No.: US13782270Application Date: 2013-03-01
-
Publication No.: US09051638B2Publication Date: 2015-06-09
- Inventor: Mark R. Erickson , Henry J. Poole , Arthur W. Custer, III , Ady Hershcovitch
- Applicant: Poole Ventura, Inc.
- Applicant Address: US CA Oxnard US NY Upton
- Assignee: POOLE VENTURA, INC.,BROOKHAVEN SCIENCE ASSOCIATES, LLC
- Current Assignee: POOLE VENTURA, INC.,BROOKHAVEN SCIENCE ASSOCIATES, LLC
- Current Assignee Address: US CA Oxnard US NY Upton
- Agency: Hall Estill Attorneys at Law
- Agent Daniel P. Dooley
- Main IPC: C23C14/35
- IPC: C23C14/35 ; C23C14/04 ; H01J37/32

Abstract:
A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.
Public/Granted literature
- US20140246313A1 IN-SITU SPUTTERING APPARATUS Public/Granted day:2014-09-04
Information query
IPC分类: