Invention Grant
- Patent Title: Control of particle flow in an aperture
- Patent Title (中): 控制孔中的颗粒流动
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Application No.: US13575357Application Date: 2011-01-26
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Publication No.: US09052262B2Publication Date: 2015-06-09
- Inventor: Johannes Adrianus Van Der Voorn
- Applicant: Johannes Adrianus Van Der Voorn
- Applicant Address: NZ Christchurch
- Assignee: IZON Science Limited
- Current Assignee: IZON Science Limited
- Current Assignee Address: NZ Christchurch
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Priority: GB1001311.8 20100127
- International Application: PCT/EP2011/051087 WO 20110126
- International Announcement: WO2011/092218 WO 20110804
- Main IPC: G01N15/12
- IPC: G01N15/12 ; G01N27/447

Abstract:
The flow of particles (18) in an aperture (10) between two reservoirs (14) and (15) is controlled by suspending the particles (18) in a fluid (17) within the aperture (10), applying a potential difference across the aperture (10) so as to tend to electrophoretically transport the particles (18) between a region of higher potential field and a region of lower potential in the fluid (17), applying a pressure differential across the aperture (10) so as to tend to transfer the fluid (17) with the particles (18) therein though the aperture (10) from a high-pressure reservoir (14) to a low-pressure reservoir (15), and adjusting the potential difference and/or the pressure differential across the aperture (10) in order to achieve precise control over the translation of the particles (18) within the aperture (10). This permits precise control of velocity and displacement, and the measured delivery of particles in solution through an aperture from one reservoir to another by means of careful command over electrical potential and pressure differential over the aperture.
Public/Granted literature
- US20130015066A1 CONTROL OF PARTICLE FLOW IN AN APERTURE Public/Granted day:2013-01-17
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