Invention Grant
- Patent Title: Measurement of depth and energy of buried trap states in dielectric films by single electron tunneling force spectroscopy
- Patent Title (中): 通过单电子隧道力光谱测量介电膜中埋陷阱状态的深度和能量
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Application No.: US14448866Application Date: 2014-07-31
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Publication No.: US09052339B2Publication Date: 2015-06-09
- Inventor: Clayton Covey Williams , Jon Paul Johnson
- Applicant: The University of Utah Research Foundation
- Applicant Address: US UT Salt Lake City
- Assignee: The University of Utah Research Foundation
- Current Assignee: The University of Utah Research Foundation
- Current Assignee Address: US UT Salt Lake City
- Agency: Stoel Rives LLP
- Main IPC: G01Q60/12
- IPC: G01Q60/12 ; B82Y35/00 ; G01Q60/14

Abstract:
A single electron tunneling force spectroscopy (SETFS) system (10) can perform a series of surface potential charge measurements at an array of voltages (V) and tip-sample heights (Z). These measurements are combined with a tunneling model that includes the dependence of the tunneling probability on trap state depth and energy. Simultaneous measurement of the depth and energy of individual trap states in a sample, such as a dielectric film, with an atomic scale of spatial resolution can be achieved. When combined with two-dimensional trap state imaging, such techniques provide for three-dimensional imaging of electronic defect states with atomic scale spatial resolution.
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