Invention Grant
US09052339B2 Measurement of depth and energy of buried trap states in dielectric films by single electron tunneling force spectroscopy 有权
通过单电子隧道力光谱测量介电膜中埋陷阱状态的深度和能量

Measurement of depth and energy of buried trap states in dielectric films by single electron tunneling force spectroscopy
Abstract:
A single electron tunneling force spectroscopy (SETFS) system (10) can perform a series of surface potential charge measurements at an array of voltages (V) and tip-sample heights (Z). These measurements are combined with a tunneling model that includes the dependence of the tunneling probability on trap state depth and energy. Simultaneous measurement of the depth and energy of individual trap states in a sample, such as a dielectric film, with an atomic scale of spatial resolution can be achieved. When combined with two-dimensional trap state imaging, such techniques provide for three-dimensional imaging of electronic defect states with atomic scale spatial resolution.
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