Invention Grant
- Patent Title: Photosensitive resin composition for forming microlens
- Patent Title (中): 用于形成微透镜的感光树脂组合物
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Application No.: US13982316Application Date: 2012-01-12
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Publication No.: US09052437B2Publication Date: 2015-06-09
- Inventor: Takahiro Sakaguchi
- Applicant: Takahiro Sakaguchi
- Applicant Address: JP Tokyo
- Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2011-018458 20110131
- International Application: PCT/JP2012/050479 WO 20120112
- International Announcement: WO2012/105288 WO 20120809
- Main IPC: C08F216/14
- IPC: C08F216/14 ; G03F7/038 ; C08F222/40 ; G02B1/04 ; C08F12/24 ; C08F212/12 ; C08F212/14 ; C08F212/32

Abstract:
There is provided a photosensitive resin composition for forming a microlens. A photosensitive resin composition for forming a microlens, the photosensitive resin composition comprising: a component (A), a component (B), a component (C) and a solvent. The component (A) is a copolymer having a maleimide structural unit of formula (1) below, a vinyl ether structural unit of formula (2) below, and at least one of the three structural units of formula (3), formula (4), and formula (5) below, the component (B) is a photosensitizer, and the component (C) is a cross-linking agent (where X is a C1-20 hydrocarbon group that optionally has an ether bond or a cyclic structure; Y is an organic group that optionally has a substituent; and Z is an aromatic hydrocarbon group or an alkoxy group that optionally has a substituent).
Public/Granted literature
- US20130310480A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROLENS Public/Granted day:2013-11-21
Information query
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