Invention Grant
US09052590B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
有权
光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法
- Patent Title: Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
- Patent Title (中): 光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法
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Application No.: US13393173Application Date: 2010-08-31
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Publication No.: US09052590B2Publication Date: 2015-06-09
- Inventor: Hidenori Takahashi , Shuji Hirano , Takayuki Ito , Hideaki Tsubaki
- Applicant: Hidenori Takahashi , Shuji Hirano , Takayuki Ito , Hideaki Tsubaki
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-200912 20090831
- International Application: PCT/JP2010/065192 WO 20100831
- International Announcement: WO2011/025070 WO 20110303
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/00 ; G03F7/20 ; G03F7/039

Abstract:
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.)
Public/Granted literature
Information query
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