Invention Grant
US09052590B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition 有权
光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
Abstract:
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.)
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