Invention Grant
- Patent Title: Microlithographic projection exposure apparatus illumination optics
- Patent Title (中): 微光刻投影曝光装置照明光学元件
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Application No.: US13325642Application Date: 2011-12-14
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Publication No.: US09052611B2Publication Date: 2015-06-09
- Inventor: Alexander Kohl
- Applicant: Alexander Kohl
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102006032810 20060714
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G03F7/20
Abstract:
Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.
Public/Granted literature
- US20120081685A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS Public/Granted day:2012-04-05
Information query
