Invention Grant
US09053288B1 Layout checking system for multiple-patterning group assignment constraints
有权
用于多图案化组分配约束的布局检查系统
- Patent Title: Layout checking system for multiple-patterning group assignment constraints
- Patent Title (中): 用于多图案化组分配约束的布局检查系统
-
Application No.: US14231273Application Date: 2014-03-31
-
Publication No.: US09053288B1Publication Date: 2015-06-09
- Inventor: Yao-Jen Hsieh , Kai-Ming Liu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW
- Agency: Lowe Hauptman & Ham, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method includes extracting multiple-patterning group assignment information of one or more layout patterns from a layout design. The layout design corresponds to a circuit design, and the one or more layout patterns corresponding to a node of the circuit design. Whether the extracted multiple-patterning group assignment information is consistent with a set of multiple-patterning group assignment constraints of the node is determined by a hardware processor.
Information query