Invention Grant
- Patent Title: DC high-voltage super-radiant free-electron based EUV source
- Patent Title (中): 直流高压超辐射自由电子基EUV源
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Application No.: US13779331Application Date: 2013-02-27
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Publication No.: US09053833B2Publication Date: 2015-06-09
- Inventor: Tomas Plettner
- Applicant: Tomas Plettner
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies, Corporation
- Current Assignee: KLA-Tencor Technologies, Corporation
- Current Assignee Address: US CA Milpitas
- Agency: JDI Patent
- Agent Joshua D. Isenberg
- Main IPC: H01J29/98
- IPC: H01J29/98 ; G21K5/04

Abstract:
An array of spatially separated beamlets is produced by a corresponding array of charged particle emitters. Each emitter is at an electrostatic potential difference with respect to an immediately adjacent emitter in the array. The beamlets are converged laterally to form an charged particle beam. The beam is modulated longitudinally with infrared radiation to form a modulated beam. The charged particles in the modulated beam are bunched longitudinally to form a bunched beam. The bunched beam may be modulated with an undulator to generate a coherent radiation output. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Public/Granted literature
- US20140239805A1 DC HIGH-VOLTAGE SUPER-RADIANT FREE-ELECTRON BASED EUV SOURCE Public/Granted day:2014-08-28
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