Invention Grant
US09053938B1 High light transmission, low sheet resistance layer for photovoltaic devices 有权
高光透射率,低电阻薄膜电阻层用于光伏器件

High light transmission, low sheet resistance layer for photovoltaic devices
Abstract:
Methods and devices are provided for forming a low-resistance, high light transmission layer. In one embodiment of the present invention, a method is provided comprised of creating a plurality of vias on a substrate, the vias formed in material that has a maximum processing temperature that less than a pre-defined threshold; adding a plurality of electrically conductive material into the vias; and solution depositing a nanowires infused window layer that has a first thickness at certain areas and a second thickness at other areas, wherein overall sheet resistance is between about 1 to 10 ohms per square, while light transmission combined is at least 70% and creates less than 5% shadow loss. The method may involve using a transparent conductive oxide layer beneath the window layer. This can create a layer that eliminates opaque bus bars or fingers associated with traditional solar cells. This may be an all-solution deposited process using only one deposition set or multiple deposition steps.
Information query
Patent Agency Ranking
0/0