Invention Grant
- Patent Title: Photolithographically defined contacts to carbon nanostructures
- Patent Title (中): 光刻定义与碳纳米结构的接触
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Application No.: US13318682Application Date: 2010-05-07
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Publication No.: US09053941B2Publication Date: 2015-06-09
- Inventor: Alan T. Johnson, Jr. , Ryan A. Jones , Samuel M. Khamis
- Applicant: Alan T. Johnson, Jr. , Ryan A. Jones , Samuel M. Khamis
- Applicant Address: US PA Philadelphia
- Assignee: The Trustees Of The University Of Pennsylvania
- Current Assignee: The Trustees Of The University Of Pennsylvania
- Current Assignee Address: US PA Philadelphia
- Agency: Baker & Hostetler LLP
- International Application: PCT/US2010/033968 WO 20100507
- International Announcement: WO2010/132284 WO 20101118
- Main IPC: H01L21/027
- IPC: H01L21/027 ; H01L21/64 ; B82Y40/00 ; H01L51/00 ; B82Y10/00 ; B82Y30/00 ; H01L51/05
Abstract:
Methods for the fabrication of nanostructures, including nanostructures comprised of carbon nanotubes, and the nanostructures, devices, and assemblies prepared by these methods, are described.
Public/Granted literature
- US20120129273A1 PHOTOLITHOGRAPHICALLY DEFINED CONTACTS TO CARBON NANOSTRUCTURES Public/Granted day:2012-05-24
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