Invention Grant
- Patent Title: Solid-state imaging device and method for manufacturing solid-state imaging device
- Patent Title (中): 固态成像装置及制造固态成像装置的方法
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Application No.: US14105887Application Date: 2013-12-13
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Publication No.: US09053995B2Publication Date: 2015-06-09
- Inventor: Nagataka Tanaka
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-164363 20130807
- Main IPC: H01L31/14
- IPC: H01L31/14 ; H01L27/146

Abstract:
According to one embodiment, a solid-state imaging device is provided. The solid-state imaging device includes a photoelectric conversion element, a floating diffusion, and an amplifying transistor. The photoelectric conversion element photoelectrically convert incident light into electric charges with an amount corresponding to an amount of the incident light, and accumulates the electric charges. The floating diffusion accumulates the electric charges read out from the photoelectric conversion element. The amplifying transistor includes a gate electrode connected to the floating diffusion, and outputs a signal based on the amount of the electric charges accumulated in the floating diffusion. The amplifying transistor includes a first concentration region disposed in at least a part of the maximum region of the depletion layer and a second concentration region disposed at a deeper position than the first concentration region, and has higher impurity concentration than that of the first concentration region.
Public/Granted literature
- US20150041866A1 SOLID-STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING SOLID-STATE IMAGING DEVICE Public/Granted day:2015-02-12
Information query
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