Invention Grant
- Patent Title: Method for manufacturing photoelectric conversion device
- Patent Title (中): 制造光电转换装置的方法
-
Application No.: US13569640Application Date: 2012-08-08
-
Publication No.: US09054002B2Publication Date: 2015-06-09
- Inventor: Mikio Arakawa , Masataka Ito
- Applicant: Mikio Arakawa , Masataka Ito
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc. IP Division
- Priority: JP2011-177126 20110812
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L27/146

Abstract:
A process of forming an isolation region that defines an active region on a semiconductor wafer, a process of forming a photoelectric conversion element in the active region defined by the isolation region, and a process of forming a micro lens over the photoelectric conversion element are provided. Alignment in the process of forming the photoelectric conversion element and alignment in the process of forming the micro lens are performed using an alignment mark formed in the process of forming the isolation region.
Public/Granted literature
- US20130040415A1 METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE Public/Granted day:2013-02-14
Information query
IPC分类: