Invention Grant
- Patent Title: Semiconductor device with laterally varying doping concentrations
- Patent Title (中): 半导体器件具有横向变化的掺杂浓度
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Application No.: US14053631Application Date: 2013-10-15
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Publication No.: US09054151B2Publication Date: 2015-06-09
- Inventor: Hans-Joachim Schulze , Franz-Josef Niedernostheide , Yvonne Gawlina
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/739 ; H01L29/36 ; H01L29/74 ; H01L29/78 ; H01L29/861 ; H01L21/263 ; H01L21/265

Abstract:
A semiconductor device includes a semiconductor body including a first surface having a normal direction defining a vertical direction, a first n-type semiconductor region arranged below the first surface and having a first maximum doping concentration and a second n-type semiconductor region arranged below the first n-type semiconductor region and including, in a vertical cross-section, two spaced apart first n-type portions each adjoining the first n-type semiconductor region, having a maximum doping concentration which is higher than the first maximum doping concentration and having a first minimum distance to the first surface, and a second n-type portion adjoining the first n-type semiconductor region, having a maximum doping concentration which is higher than the first maximum doping concentration and a second minimum distance to the first surface which is larger than the first minimum distance. A p-type second semiconductor layer forms a pn-junction with the second n-type portion.
Public/Granted literature
- US20140034998A1 Semiconductor Device with Laterally Varying Doping Concentrations Public/Granted day:2014-02-06
Information query
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