Invention Grant
- Patent Title: Integrated capacitor having a non-uniform thickness
- Patent Title (中): 具有不均匀厚度的集成电容器
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Application No.: US12649235Application Date: 2009-12-29
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Publication No.: US09054225B2Publication Date: 2015-06-09
- Inventor: Antonio Di Franco
- Applicant: Antonio Di Franco
- Applicant Address: IT Agrate Brianza (MB)
- Assignee: STMicroelectronics S.r.l.
- Current Assignee: STMicroelectronics S.r.l.
- Current Assignee Address: IT Agrate Brianza (MB)
- Agency: Gardere Wynne Sewell LLP
- Priority: ITMI2008A2353 20081230
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L49/02 ; H01L23/522

Abstract:
An embodiment of an electronic device integrated in a chip of semiconductor material and an embodiment of a corresponding production method are proposed. The electronic device includes a capacitor having a first conductive plate, a second conductive plate, and an insulating layer for insulating the first plate from the second plate. In an embodiment of the disclosure, at least a selected one between the first plate and the second plate has a non-uniform thickness.
Public/Granted literature
- US20100164066A1 INTEGRATED CAPACITOR HAVING A NON-UNIFORM THICKNESS Public/Granted day:2010-07-01
Information query
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