Invention Grant
- Patent Title: Bi-directional bipolar junction transistor for high voltage electrostatic discharge protection
- Patent Title (中): 用于高压静电放电保护的双向双极结型晶体管
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Application No.: US13656232Application Date: 2012-10-19
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Publication No.: US09054524B2Publication Date: 2015-06-09
- Inventor: Hsin-Liang Chen , Shuo-Lun Tu
- Applicant: Macronix International Co., Ltd.
- Applicant Address: TW
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW
- Agency: Alston & Bird LLP
- Main IPC: H01L29/47
- IPC: H01L29/47 ; H02H7/09 ; H02H9/04 ; H01L27/02 ; H01L29/74

Abstract:
A bi-directional electrostatic discharge (ESD) protection device may include a substrate, an N+ doped buried layer, an N-type well region and two P-type well regions. The N+ doped buried layer may be disposed proximate to the substrate. The N-type well region may encompass the two P-type well regions such that a portion of the N-type well region is interposed between the two P-type well regions. The P-type well regions may be disposed proximate to the N+ doped buried layer and comprise one or more N+ doped plates and one or more P+ doped plates.
Public/Granted literature
- US20140111890A1 BI-DIRECTIONAL BIPOLAR JUNCTION TRANSISTOR FOR HIGH VOLTAGE ELECTROSTATIC DISCHARGE PROTECTION Public/Granted day:2014-04-24
Information query
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