Invention Grant
- Patent Title: Charge pump and method of biasing deep N-well in charge pump
- Patent Title (中): 电荷泵和偏置电荷泵深N阱的方法
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Application No.: US14212345Application Date: 2014-03-14
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Publication No.: US09054577B2Publication Date: 2015-06-09
- Inventor: Yvonne Lin , Tien-Chun Yang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW
- Agency: Lowe Hauptman & Ham, LLP
- Main IPC: H02M3/07
- IPC: H02M3/07 ; G11C5/14

Abstract:
A charge pump has at least one charge pump stage. Each charge pump stage includes at least one NMOS device. The at least one NMOS device has a deep N-well (DNW), a gate and a drain, and is coupled to at least one capacitor, a first node, a second node and a switch. For the at least one NMOS device, the gate is capable of receiving a different signal from the drain. The first node is arranged to receive an input signal. The switch is coupled between the at least one NMOS device and a ground. A drain of the switch is coupled to a deep N-well of the switch. The at least one capacitor is arranged to store electrical charges. The charge pump stage is configured to supply the electrical charges to the second node. The DNW is coupled to the ground for a negative pump operation.
Public/Granted literature
- US20140197881A1 CHARGE PUMP AND METHOD OF BIASING DEEP N-WELL IN CHARGE PUMP Public/Granted day:2014-07-17
Information query
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